Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity

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JINXING MATECH CO LTD

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Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity

Name: Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity
Brand: High Purity Titanium Aluminium Zirconium Chrome Sputtering Target
Price: 100 USD

Quality Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity for sale

Brand Name : High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

Model Number : plates

Certification : ASTM

Place of Origin : China

MOQ : Negotiable

Price : 100USD-200USd

Payment Terms : L/C, T/T

Supply Ability : 10ton/month

Delivery Time : 10-30days

Packaging Details : Standard packing

State : annealed

Rm(≥)/MPa : 379

Rp0.2(Pa : 207

A50mm(≥)/% : 16

name : High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

material : Zr702, Zr704, Zr705

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High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic materials.

FANMETAL Produces high-purity pure metal and alloy sputtering targets with the highest density and smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We typically use vacuum melting or hot isostatic pressing (HIP) for production. We choose the appropriate production process to create a product that meets your specific application requirements.

Our sputtering targets are in a comprehensive range, purity levels, shapes and sizes. For example, the most common target shapes include circular, rectangular, annular and tubular. Depending on the size of the target and the nature of the material, they can be single-segmented or multi-segmented. We can customize according to your needs.

Titanium Aluminium Zirconium Chrome Sputtering Target Specification

Product name	Titanium target for pvd coating machine
Grade	Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc
Origin	Henan Province china
Titanium content	≥99.5 (%)
Impurity content	<0.02 (%)
Density	4.51 or 4.50 g/cm3
Standard	ASTM B381; ASTM F67, ASTM F136
Size	1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available
Technique	Forged and CNC Machined
Application	Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.
Feature	1. Low density, high gauge strength 2. Excellent corrosion resistance 3. Has good heat resistance 4. Excellent low temperature resistance 5. Non-magnetic and non-toxic 6. Good thermal performance

Titanium Aluminium Zirconium Chrome Sputtering Target Picture:

titanium sputtering target	Aluminium sputtering target	Zirconium sputtering target	chrome sputtering target
99.8%	99.99%	99.8%	99.8%

Nitride Ceramic Sputtering Target
Materials	Purity	Inquiry
Aluminum Nitride (AlN) Sputtering targets	2N5-3N	Inquiry
Chromium Nitride (Cr2N) Sputtering targets	2N5-3N	Inquiry
Iron Nitride (FeN4) Sputtering targets	3N	Inquiry
Niobium Nitride (NbN) Sputtering targets	2N5	Inquiry
Tantalum Nitride (TaN) Sputtering targets	2N5	Inquiry
Vanadium Nitride (VN) Sputtering targets	2N5	Inquiry
Zirconium Nitride (ZrN) Sputtering targets	2N5	Inquiry
Boron Nitride (BN) Sputtering targets	2N5	Inquiry
Germanium Nitride (Ge3N4) Sputtering targets	3N	Inquiry
Hafnium Nitride (HfN) Sputtering targets	2N5	Inquiry
Silicon Nitride (Si3N4) Sputtering targets	2N5-3N	Inquiry
Titanium Nitride (TiN) Sputtering targets	2N5	Inquiry
Zinc Nitride (Zn3N2)Sputtering targets	3N	Inquiry

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